Center for Relativistic Laser Science

General Information
■ System Performance
1. Film thickness uniformity < ±5% in 4inch area
2. E-beam source : 2cc, 3kW (2set)
3. Resitance heater :
   Tungsten boat type((W)10mm x (L)100mm) (1set)
4. Heating temp. on substrate : Max. 650℃
5. Heating uniformity : < ±5% in 4inch area
■ System Specification
=== Vacuum Chamber ===
1. Material : Electro-polished 304 stainless steel
2. Chamber shape : Welded front door box type
3. Chamber demension : 500(w)x550(d)x550(h)
4. Top plate : Substrate module mount
5. Bottom plate
Thermal source source module mount
Rail type single substrate transfer
Main pumping system common use
=== Vacuum Control ===
1. Rotary vane pump : 500 L/min or more
2. Cryo pump : 1,500 L/sec for N2
3. Pumping line vacuum gauge : T/C Gauge
4. Chamber vacuum gauge
     Hot cathode ion gauge sensor high vacuum
=== Substrate Module ===
1. Sample Size : 4\" single wafer, Water cooling type mold heater
2. Heater : Max Temp : 650 ℃, Thermocouple type : k-type, Programable temperature controller,
3. Rotator : Max 20rpm, Water cooled vacuum seal feedthrough
4. Thickness control : 4 ch control
5. Co-evap monitor sensor : 3 ch
6. Load lock assemblies
7. Warranty
• 12 months of warranty after installation
• Maintenance contract available at the end of the 12 month period.
• Exclusive consumable part

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