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Rapid Thermal Processing System (순간 열처리 시스템)

equipment explanation
Model RTP-1300
Operating time SUN(00:00~24:00)
MON(00:00~24:00)
TUE(00:00~24:00)
WED(00:00~24:00)
THU(00:00~24:00)
FRI(00:00~24:00)
SAT(00:00~24:00)
Location 86391
inquiry Hyunyong Song
010-9193-4035
Reservation

Notice

 

Available Time // Always possible.

  

Notice // If you want to have training for using this equipment, please contact Super-user.

 

Current Status // Now on operation.

Rapid thermal annealing system


Film or small sample only for short period
(less than 10 min.)
1. Temp. : Max 1200 [°C]
2. Raising temp speed : 50~80 [°C/sec.]
3. Measurable sample size: 4 [inch] wafer
4. weight: Apprx 57[kg]
5. size: Apprx 50 x 70 x 58[cm]
6. Electricity: 220[V], 3 [phase]
7. Power supply: Max 43[A], current rage 39[A].
8. Heating lamp: hallogen lamp. 12 Nos. 1.5[kw] each.
9. Cooling system by Water
10. Gas flow port for Gas purge(N2/Ar/O2and etc) in and out.
11. Vacuum status: Max 10-3 [Torr]
12 . K type thermocouple.
13. susceptor: transparent quartz.

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